Influence of thickness on microstructural and magnetic properties in Fe3O4 thin films produced by PLD

Influence of thickness on microstructural and magnetic properties in Fe3O4 thin films produced by PLD
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DOI:
10.1016/j.jmmm.2004.08.004
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发表时间:
2005-01-01
影响因子:
2.7
通讯作者:
Esquinazi, P
Esquinazi, P
中科院分区:
材料科学3区
文献类型:
--
作者:
Bollero, A;Ziese, M;Esquinazi, P

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脉冲激光沉积技术已用于生产磁铁矿(FE3O4)膜,其厚度为厚度为26至320 nm的MGAL2O4(100)底物在底物上生长。薄膜的微观结构表征揭示了厚度增加的晶粒扩大,即沉积时间。磁化磁滞回路已在不同温度下在25-300 K的不同温度下进行了三个样品:两个厚度为26和320的膜,该膜沉积在MGAL2O2上(100)(100),以比较,在MGO上沉积了​​30 nm厚的膜(100 nm厚的膜(100) )。延迟的演变和与温度的矫正性显示出较薄的膜和较厚的膜之间的显着差异,这是根据界面菌株的影响以及沉积时间对晶粒的影响以及晶粒变化的影响。反相边界的密度。所有研究的膜在约130 K处表现出最小的固定性。磁晶型各向异性常数K-1消失了散装材料的温度。 (c)2004 Elsevier B.V.保留所有权利。
The pulsed laser deposition technique has been used to produce magnetite (Fe3O4) films with thickness ranging front 26 to 320 nm grown on MgAl2O4 (100) substrates. Microstructural characterisation of the films has revealed enlarged grains with increasing thickness, i.e. deposition time. Magnetisation hysteresis loops have been rneasured at different temperatures in the range 25-300 K for three samples: two films with thickness of 26 and 320 rim deposited on MgAl2O2 (100) and, for comparison, a 30 nm thick film deposited on MgO (100). The evolution of the remanence and the coercivity with temperature shows significant differences between the thinner films and the thicker one which are explained in terms of the effect of the interfacial strain as well as the influence of the deposition time on the grain and the variation in the density of antiphase boundaries. All the studied films exhibit a minimum of the coercivity at about 130 K. the temperature at which the magnetocrystalline anisotropy constant K-1 vanishes for the bulk material. (C) 2004 Elsevier B.V. All rights reserved.