Diffusion of Li in the silicon oxide films and evaluation of Li-induced surface potential
Diffusion of Li in the silicon oxide films and evaluation of Li-induced surface potential
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Li在氧化硅膜中的扩散以及Li诱导表面电位的评估
DOI:
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发表时间:
2005
期刊:
影响因子:
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通讯作者:
Michiharu Tabe
中科院分区:
文献类型:
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作者:
Masahiko Maeda;Teruyoshi Watanabe;Yasuhiro Imai;Yasuhiko Ishikawa;Michiharu Tabe