Plasma-Erosion Properties of Ceramic Coating Prepared by Plasma Spraying
Plasma-Erosion Properties of Ceramic Coating Prepared by Plasma Spraying
复制标题
等离子喷涂陶瓷涂层的等离子侵蚀性能
DOI：
10.2320/matertrans.47.1677
复制
发表时间：
2006
期刊：
影响因子：
--
通讯作者：
I. Aoki
中科院分区：
文献类型：
--
作者：
J. Kitamura;H. Mizuno;Nobuaki Kato;I. Aoki
近年来，等离子喷涂陶瓷涂层在半导体和液晶显示器(LCD)生产设备中的应用急剧增加，其纯度高达99.9%以上。随着硅片尺寸的增大和LCD尺寸的增大，设备的尺寸越来越大，这促进了从传统技术，如氧化铝薄膜和块体陶瓷，到等离子喷涂涂层的替代，这些涂层要求具有较高的抗等离子体侵蚀耐久性(抗等离子体侵蚀)。然而，到目前为止，还没有关于等离子体烧蚀特性的系统研究报道。用反应离子刻蚀(RIE)系统研究了等离子喷涂氧化铝和氧化钇涂层对CF4/O2等离子体的耐久性，并与常规工艺进行了比较。通过显微组织分析，探讨了冲蚀机理及对粉末性能的影响。
Application of plasma sprayed ceramic coatings with a high purity of more than 99.9% has been sharply increasing in semiconductor and liquid-crystal-display (LCD) production equipments in the last few years. The size of the equipments becomes larger with increasing Si wafer size and the LCD size that promotes the replacement from conventional techniques, such as alumite film and bulk ceramics, to plasma spray coatings, where the high durability against the plasma erosion (anti-plasma erosion resistance) is required. However, as far as we know, no systematic studies on the plasma-erosion properties are reported. In this work, durability of plasma sprayed alumina and yttria coatings against CF 4 /O 2 plasma are investigated by reactive ion etching (RIE) system and are compared to that of the conventional techniques. The erosion mechanism and the effect of the powder properties are discussed through the micro-structural analysis.