Three-dimensional micropatterning of graphene by femtosecond laser direct writing technology
Three-dimensional micropatterning of graphene by femtosecond laser direct writing technology
复制标题
飞秒激光直写技术石墨烯三维微图案化
DOI：
10.1364/ol.45.000113
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发表时间：
2020-01-01
期刊：
影响因子：
3.6
通讯作者：
Yang, Han
中科院分区：
文献类型：
--
作者：
Liu, Yu-Qing;Mao, Jiang-Wei;Yang, Han
氧化石墨烯（GO）的还原和图案化在基因转染、细胞分化控制等方面具有广泛的应用。然而，二维（2D）光还原技术（如紫外光刻）无法实现GO的三维（3D）还原和图案化，限制了其在3D电子器件互连和3D石墨烯片上器官中的应用。在这里，我们开发了通过飞秒激光直写（FsLDW）技术对GO进行3D还原和图案化。 FsLDW 已用于 GO 薄膜上还原 GO 的 3D 结构制造和 2D/3D 微图案化。我们认为这项技术将推动 GO 在未来电子产品的发展中取得进步。
The reduction and patterning of graphene oxides (GOs) have broad applications in gene transfection, cell differentiation control, etc. However, two-dimensional (2D) photoreduction technologies (such as UV lithography) fail to realize the three-dimensional (3D) reduction and patterning of GO, limiting its applications in 3D electronic device interconnection and 3D graphene organ-on-a-chip. Here we developed 3D reduction and patterning of GO by femtosecond laser direct writing (FsLDW) technology. FsLDW has been adopted for 3D structure fabrication and 2D/3D micropatterning of reduced GOs on GO films. We deem that this technology will advance GO in the evolution of future electronics.