Femtosecond Laser Direct Writing of 3D Silica-like Microstructure from Hybrid Epoxy Cyclohexyl POSS
Femtosecond Laser Direct Writing of 3D Silica-like Microstructure from Hybrid Epoxy Cyclohexyl POSS
复制标题
飞秒激光直写混合环氧环己基 POSS 的 3D 类二氧化硅微结构
DOI:
10.1002/admt.201700271
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发表时间:
2018-03-01
影响因子:
6.8
通讯作者:
Duan, Xuanming
中科院分区:
文献类型:
--
作者:
Fang, Gan;Cao, Hongzhong;Duan, Xuanming
Given the importance of epoxy cyclohexyl polyhedral oligomeric silsesquioxane (epoxy-POSS) as a silica-like hybrid material of optical clarity, high thermal and mechanic stability, the two-photon initiated polymerization of epoxy-POSS using diphenyliodonium hexafluorophosphate as photoacid generators for UV lithography and femtosecond laser direct writing is studied. The hybrid resist exhibits high thermal stability: decomposition temperatures are found at approximate to 350 and 400 degrees C when calcined in air and argon, respectively. The corresponding calcined products are found as silica-like structures with chemical formulas of C1.5SiO3.5 and C5SiO3, evidenced by energy dispersive X-ray analysis (EDX), fourier-transform infrared spectroscopy (FTIR), and elemental analysis. An equation regarding the two-photon polymerized line width as functions of intensity of laser (P-laser) and scanning speed (V) is proposed in describing the effect of Gaussian light on polymerized lines. Experimental verification of the equation is given to prove a nonlinear optical process. Line width with a resolution of 250 nm is achieved on a glass substrate, while the resolution is 400 nm when fabricated on a silicon wafer. 3D structured woodpiles are fabricated and show no volumetric shrinkage upon 300 degrees C calcination in air environment, demonstrating a high thermal stability.