Statistics of Electron Multiplication

Statistics of Electron Multiplication
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DOI:
10.1063/1.1717310
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发表时间:
1961-02
影响因子:
1.6
通讯作者:
F. Lombard;F. Martin
F. Lombard;F. Martin
中科院分区:
工程技术4区
文献类型:
--
作者:
F. Lombard;F. Martin

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假设在每一级处的泊松分布,已经计算了针对单个电子输入的电子倍增器结构的输出处的脉冲高度分布。给出的图表说明了脉冲高度分布的变化作为级数的函数。这已经针对1.5、2.0、3.0和5.0的级间乘法完成。
The pulse‐height distribution at the output of an electron multiplier structure for a single electron input has been calculated assuming a Poisson distribution at each stage. Graphs are given which illustrate the change in pulse‐height distribution as a function of the number of stages. This has been done for interstage multiplications of 1.5, 2.0, 3.0, and 5.0.