Quartz crystal microbalance-based system for high-sensitivity differential sputter yield measurements.
Quartz crystal microbalance-based system for high-sensitivity differential sputter yield measurements.
复制标题
基于石英晶体微天平的系统，用于高灵敏度微分溅射产率测量。
DOI：
10.1063/1.3249560
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发表时间：
2009
期刊：
影响因子：
--
通讯作者：
A. Yalin
中科院分区：
文献类型：
--
作者：
B. Rubin;J. Topper;C. Farnell;A. Yalin
我们提出了一种基于石英晶体微天平的高灵敏度差分溅射产额测量系统，用于测量不同靶材料的离子轰击产额。可以对不同的溅射产额进行积分，以求出总产额。可能的离子束条件包括离子能量在30-350 eV范围内，入射角度与正常值成0度-70度。四栅离子光学系统用于在低能(<；100 eV)实现准直离子束，两栅离子光学系统用于高能(高达750 eV)。还使用了一种互补的失重方法来测量总溅射产额。给出了验证实验，证实了溅射产额测量的高灵敏度和准确性。
We present a quartz crystal microbalance-based system for high sensitivity differential sputter yield measurements of different target materials due to ion bombardment. The differential sputter yields can be integrated to find total yields. Possible ion beam conditions include ion energies in the range of 30-350 eV and incidence angles of 0 degrees-70 degrees from normal. A four-grid ion optics system is used to achieve a collimated ion beam at low energy (<100 eV) and a two-grid ion optics is used for higher energies (up to 750 eV). A complementary weight loss approach is also used to measure total sputter yields. Validation experiments are presented that confirm high sensitivity and accuracy of sputter yield measurements.