Thermally stabilized photoinduced Bragg gratings
Thermally stabilized photoinduced Bragg gratings
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热稳定光致布拉格光栅
DOI：
10.1063/1.1506017
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发表时间：
2002
期刊：
影响因子：
--
通讯作者：
I. Miyamoto
中科院分区：
文献类型：
--
作者：
J. Nishii;K. Kintaka;Hiroaki Nishiyama;T. Sano;E. Ohmura;I. Miyamoto
用KrF准分子激光通过相位掩模在Ge-SiO2和Ge-B-SiO2玻璃薄膜上印制了布拉格光栅。印刷在Ge-B-SiO2膜中的光栅的衍射效率比Ge-SiO2膜的衍射效率大约高一个数量级。虽然在低于500 ° C的温度下退火时光栅几乎被擦除，但是在600 ° C下退火后，仅在Ge-B-SiO2膜中形成具有比退火前高得多的衍射效率的光栅。 光栅的衍射效率在室温和600 ° C之间重复加热时不变。
Bragg gratings were printed in Ge–SiO2 and Ge–B–SiO2 thin glass films by KrF excimer laser irradiation through a phase mask. The diffraction efficiency of the grating printed in the Ge–B–SiO2 film was approximately one order of magnitude greater than that of the Ge–SiO2 film. Although the gratings were almost erased upon annealing at temperatures lower than 500 °C, a grating with much higher diffraction efficiency than before annealing was formed exclusively in the Ge–B–SiO2 film after annealing at 600 °C. The diffraction efficiency of the grating was unchanged upon repeated heating between room temperature and 600 °C.