Ab initio molecular orbital characterization of dimethyl group-III azides as sources for photolytic production of free radical beams
Ab initio molecular orbital characterization of dimethyl group-III azides as sources for photolytic production of free radical beams
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二甲基 III 叠氮化物作为自由基束光解产生源的从头算分子轨道表征
DOI:
10.1116/1.1460895
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发表时间:
2002
期刊:
影响因子:
--
通讯作者:
Seiji Kawakita
中科院分区:
文献类型:
--
作者:
K. Hayashi;T. Kanayama;T. Shimizu;Y. Kawamura;Kenji Kameko;Seiji Kawakita
Use of a beam of biradicaloid such as dialkyl group-III nitrene produced by the method of photodissociation of energetic compound beams (PDECB) is expected to be advantageous to the low-temperature thin-film growth of stoichiometric group-III nitride. Through the clarification of fundamental processes involved in pyrolysis as well as photolysis of dimethylgallium azide [(CH3)2GaN3], dimethylaluminum azide [(CH3)2AlN3], and dimethylboron azide [(CH3)2BN3] based on post-self-consistent field ab initio molecular orbital methods, we discuss the suitability of these possible source compounds for the production of beams of dimethylgalliumnitrene [(CH3)2GaN], dimethylaluminumnitrene [(CH3)2AlN], and dimethylboronnitrene [(CH3)2BN] by the PDECB method. The theoretical results suggested that (CH3)2GaN3 is a promising PDECB source material in that this molecule possesses the nature of unimolecular metastable dye.