Fabrication of low-loss optical waveguides using a novel photosensitive polyimide
Fabrication of low-loss optical waveguides using a novel photosensitive polyimide
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使用新型光敏聚酰亚胺制造低损耗光波导
DOI：
10.1117/12.475449
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发表时间：
2003
期刊：
影响因子：
--
通讯作者：
N. Peyghambarian
中科院分区：
文献类型：
--
作者：
K. Mune;R. Naito;T. Fukuoka;A. Mochizuki;Kenji Matsumoto;N. Yurt;G. Meredith;G. Jabbour;N. Peyghambarian
介绍了一种利用光敏性聚酰亚胺(PSPI)通过简单的图案化工艺制作光波导的方法。采用光刻工艺制作了基于PSPI的光波导，无需采用干法刻蚀工艺。PSPI清漆由氟化二胺和氟化四元酸二酸酐合成的聚酰胺酸(PAA)和光敏剂组成。PSPI的玻璃化转变温度(Tg)为330℃，热膨胀系数为40ppm/K，无色，在1.3和1.55im处有较低的吸收。制作的波导的侧壁和表面非常光滑，这对于低损耗的光学模式传输和由于缺陷而导致的模式的低散射是必不可少的。在石英玻璃衬底上制作了单模和多模埋脊光波导，并对其进行了测试。用标准的缩减法测量了光传输损耗，发现损耗低至0.4dB/cm@1.55Jim。这种制造工艺有望为高性能光电器件的低成本生产做出贡献。
Fabrication of optical waveguides by a simple patterning process using photosensitive polyimide (PSPI) is described. Light waveguide based on PSPI was fabricated by photolithographic processing without use of dry etching process. The PSPI varnish is comprised of polyamic acid (PAA) which was made from fluorinated diamine and fluorinated tetracarboxylic dianhydride, and photosensitizer. The PSPI has the following characteristics: glass transition temperature (Tg) of 330 °C, coefficient of thermal expansion of 40 ppm/K. Moreover the PSPI is colorless, and posses low absorption at 1 .3 and 1 .55im. The sidewalls and the surfaces ofthe fabricated waveguide are very smooth, which is essential for the low loss optical mode propagation and lower scattering of the mode due to the imperfections. Single and multimode buried ridge waveguides on quartz glass substrate were fabricated and tested. Optical propagation losses were measured by standard cut back method and found to be as low as 0.4 dB/cm @ 1.55 jim. This fabrication process would be expected to contribute to low cost production for high performance opto-electronic devices.