In-situ monitoring of plasma enhanced nitriding processes using infrared absorption and mass spectroscopy
In-situ monitoring of plasma enhanced nitriding processes using infrared absorption and mass spectroscopy
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DOI：
10.1016/j.surfcoat.2012.03.067
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发表时间：
2012-05-25
影响因子：
5.4
通讯作者：
Roepcke, J.
中科院分区：
文献类型：
--
作者：
Burlacov, I.;Boerner, K.;Roepcke, J.
活性屏（AS）渗氮是一种先进的钢件离子渗氮技术，与传统的离子渗氮相比具有许多优点。AS技术是近十年来发展起来的一种新技术，目前已在工业上得到应用，但对AS的基本机理及其相互关系的认识还不完全。首次将中红外可调谐二极管激光吸收技术与四重质谱联用技术应用于该工作中。原位诊断的化学现象在N-2-H-2等离子体的工艺条件，如H-2到N-2气体比，工艺温度和偏置激活功率的变化提供了有价值的信息，在样品的表面附近的活性氮物种的浓度。代表氮化效率的化合物层的厚度被用作对氮化条件的响应，用于评价来自等离子体诊断研究的选定工艺参数。N-2-H-2工艺气体的1：1气体混合物似乎对获得厚化合物层最有效。(c)2012 Elsevier B. V.保留所有权利。
The active screen (AS) nitriding is an advanced technology for the plasma nitriding of steel components providing a number of advantages over conventional plasma nitriding. Developed in the last decade, the AS technology has found its industrial application, however the understanding of the fundamental mechanisms and their relationship is not complete. For the first time the mid infrared tunable diode laser absorption technique in combination with the quadruple mass spectrometry has been applied in this work. In-situ diagnostics of chemical phenomena in the N-2-H-2 plasmas under variation of the process conditions such as H-2 to N-2 gas ratio, process temperature and bias activation power provided valuable information about the concentration of active nitrogen species in the vicinity of the samples' surfaces. The thickness of the compound layer representing the nitriding efficiency was used as a response to nitriding conditions for the evaluation of selected process parameters derived from the plasma diagnostic studies. A 1:1 gas mixture of the N-2-H-2 process gases seems to be most effective to get thick compound layers. (c) 2012 Elsevier B.V. All rights reserved.