A Pseudo-Elliptical Response Filter at W-Band Fabricated With Thick SU-8 Photo-Resist Technology
A Pseudo-Elliptical Response Filter at W-Band Fabricated With Thick SU-8 Photo-Resist Technology
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DOI：
10.1109/lmwc.2012.2183861
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发表时间：
2012-03-01
影响因子：
3
通讯作者：
Rebollar, Jesus M.
中科院分区：
文献类型：
--
作者：
Leal-Sevillano, Carlos A.;Montejo-Garai, Jose R.;Rebollar, Jesus M.
给出了W波段伪椭圆响应滤波器的设计和实验验证。滤光片采用了基于厚SU-8光刻胶的微机械加工技术。这种优化的结构特别适合于利用微机械技术实现具有传输零点的滤波器，因为提取的极点是由没有虹膜的简单短桩实现的。此外，还提出了一种仅使用三个SU-8层的新型拓扑结构。这种新的拓扑结构包括一种新颖的优化输入/输出布线，可用于设计具有快速和低成本生产的高性能器件。制作了具有两个传输零点的四阶滤波器(带宽为5%)，插入损耗为1.2分贝。这一损耗水平相当于W波段微机械滤光器的实际技术水平，尽管在本设计中使用了更低的高度和H平面中的分裂块。
The design and experimental validation of a pseudo-elliptical response filter at W-Band is presented. A micromachining technique based on the thick SU-8 photo-resist is used to construct the filter. The optimized structure is specially well-suited for the implementation of filters with transmission zeros by means of micromachining techniques, since the extracted poles are implemented by simple stubs without irises. Furthermore, a novel topology based on the use of only three SU-8 layers is presented. This new topology, which includes a novel optimized input/output routing, can be potentially used for the design of high-performance devices with a fast and low-cost production. A fourth-order filter with two transmission zeros has been fabricated (bandwidth 5%), presenting 1.2 dB of insertion loss. This level of loss is equivalent to the actual state-of-art for micromachined filters at W-band, in spite of the reduced height and the split block in the H-plane used in the presented design.