Growth of High Aspect Ratio Nanometer-Scale Magnets with Chemical Vapor Deposition and Scanning Tunneling Microscopy
Growth of High Aspect Ratio Nanometer-Scale Magnets with Chemical Vapor Deposition and Scanning Tunneling Microscopy
复制标题
利用化学气相沉积和扫描隧道显微镜生长高纵横比纳米级磁体
DOI：
10.1126/science.262.5137.1249
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发表时间：
1993
期刊：
影响因子：
56.9
通讯作者：
D. Awschalom
中科院分区：
文献类型：
--
作者：
A. Kent;T. Shaw;Stephan von Moln�r;D. Awschalom
化学气相沉积和扫描隧道显微镜技术的组合已被用来生产纳米级，含铁的沉积物与高纵横比的五羰基铁前体上的基板和隧道尖端本身。通过透射电子显微镜和高空间分辨率俄歇电子能谱法测定所得纳米沉积物的结构和组成。多晶、相对纯的体心立方铁或无序的富碳材料都可以沉积，这取决于尖端样品结的偏压条件和前体压力。从生长现象学推断出两种分解机制。
A combination of chemical vapor deposition and scanning tunneling microscopy techniques have been used to produce nanometer-scale, iron-containing deposits with high aspect ratios from an iron pentacarbonyl precursor both on a substrate and on the tunneling tip itself. The structure and composition of the resulting nanodeposits were determined by transmission electron microscopy and high spatial resolution Auger electron spectroscopy. Either polycrystalline, relatively pure, body-centered-cubic iron or disordered carbon-rich material can be deposited, depending on the bias conditions of the tip sample junction and the precursor pressure. Two mechanisms of decomposition are inferred from the growth phenomenology.