Synchrotron x-ray microscopy studies on electromigration of a two-phase material
Synchrotron x-ray microscopy studies on electromigration of a two-phase material
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DOI：
10.1063/1.2777122
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发表时间：
2007-09
影响因子：
3.2
通讯作者：
Andre Lee;Wenjun Liu;C. Ho;K. N. Subramanian
中科院分区：
文献类型：
--
作者：
Andre Lee;Wenjun Liu;C. Ho;K. N. Subramanian
基本问题包括导电成分的运动和微观结构的演变，从高电流密度的单相材料有很好的记录。近年来，多相材料中导电成分的电迁移引起了人们的关注，这是由于在微电子技术中使用这种合金进行互连的必要性。这些合金的研究使用复杂的工业几何结构，受到电流拥挤等因素的影响。因此，从这些研究中无法对多相合金电迁移的作用机制有一个基本的了解。因此，从这些研究中提出的一些机制涉及拟合参数和尚未充分理解的复杂扩散过程。为了避免电流拥挤和相关的局部焦耳加热而设计的关节结构适合于评估电迁移引起的微观结构事件。同步加速器x射线显微镜提供了有关二维和三维晶体取向和这种接头中的应变场的信息，有助于发展对两相合金电迁移的基本理解。基本问题包括导电成分的运动和微观结构的演变，从高电流密度的单相材料有很好的记录。近年来，多相材料中导电成分的电迁移引起了人们的关注，这是由于在微电子技术中使用这种合金进行互连的必要性。这些合金的研究使用复杂的工业几何结构，受到电流拥挤等因素的影响。因此，从这些研究中无法对多相合金电迁移的作用机制有一个基本的了解。因此，从这些研究中提出的一些机制涉及拟合参数和尚未充分理解的复杂扩散过程。为了避免电流拥挤和相关的局部焦耳加热而设计的关节结构适合于评估电迁移引起的微观结构事件。同步加速器x射线显微镜提供了有关二维和三维晶体学的信息。
Basic issues involving movement of conductive constituents and microstructural evolution from high current density in single phase materials are well documented. Recently, electromigration of conductive constituents in multiphase materials has gained attention due to the necessity of employing such alloys for interconnects in microelectronics. Reported studies on these alloys using complicated industrial geometry suffer from contributions such as current crowding. Hence a basic understanding on operative mechanisms during electromigration in multiphase alloys cannot be gained from these studies. Consequently, several mechanisms proposed from these studies involve fitting parameters and not well-understood complex diffusional processes. A joint configuration designed to avoid current crowding and associated local Joule heating is suitable for evaluating electromigration induced microstructural events. Synchrotron x-ray microscopy has provided information regarding two- and three-dimensional crystallographic orientations and strain fields in such joints, aiding the development of a basic understanding of electromigration in two-phase alloys.Basic issues involving movement of conductive constituents and microstructural evolution from high current density in single phase materials are well documented. Recently, electromigration of conductive constituents in multiphase materials has gained attention due to the necessity of employing such alloys for interconnects in microelectronics. Reported studies on these alloys using complicated industrial geometry suffer from contributions such as current crowding. Hence a basic understanding on operative mechanisms during electromigration in multiphase alloys cannot be gained from these studies. Consequently, several mechanisms proposed from these studies involve fitting parameters and not well-understood complex diffusional processes. A joint configuration designed to avoid current crowding and associated local Joule heating is suitable for evaluating electromigration induced microstructural events. Synchrotron x-ray microscopy has provided information regarding two- and three-dimensional crystallographi...