A unifying correlation for laminar particle deposition in 90-degree pipe bends

A unifying correlation for laminar particle deposition in 90-degree pipe bends
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DOI:
10.1016/j.powtec.2018.12.095
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发表时间:
2019-03-01
期刊:
影响因子:
5.2
通讯作者:
Inthavong, Kiao
Inthavong, Kiao
中科院分区:
工程技术2区
文献类型:
--
作者:
Inthavong, Kiao

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管网和管道系统呈现出无数的管道几何形状组合,例如:管道直径、弯曲半径、流量——这些参数中的每一个都会导致不同的流场。当颗粒悬浮在流中时,流体-颗粒动力学也取决于颗粒直径。文献综述显示,各种颗粒沉积研究普遍倾向于湍流研究,并且对特定管道配置没有偏好。本研究对层流弯管流中的微米颗粒沉积进行了全面分析。该数据集由 8 个管道直径、9 个弯曲半径、3 个雷诺数和 30 个颗粒直径(从 1·1 μm 到 100 μm)的组合组成。二次流通过涡流核心可视化,并且可以看到流线缠绕在核心周围。这描绘了当流动从水平方向转向垂直方向时影响颗粒沉积的涡流行为。将管道几何形状、流动条件和颗粒直径的组合的沉积效率相对于颗粒斯托克斯数绘制出来。沉积轮廓呈现 S 形形状,并且提出使用反正切函数作为 90 度弯曲中微米颗粒沉积的统一相关性,给出为 eta = 2/pi tan(-1) (aSt(b))。该模型的局限性在于它没有考虑沉降效应,沉降效应可能会影响弯曲入口处的颗粒位置,特别是对于 >30 μm 的颗粒。对于粒子 1000。Crown 版权所有 (C) 2019 由 Elsevier B.V 出版。保留所有权利。
Pipe networks and ducting systems present a myriad of pipe geometry combinations e.g. pipe diameter, bend radius, flowrate-with each of these parameters leading to different flow fields. When particles are suspended in the flow, the fluid-particle dynamics then depend on the particle diameter as well. The literature review showed a variety of particle deposition studies with a prevalence towards turbulent flow studies, and no preference for a specific pipe configuration. This study presents a comprehensive analysis of micron particle deposition in laminar pipe bend flows. The data set consisted of combinations of 8 pipe diameters, 9 bend radii, 3 Reynolds numbers, and 30 particle diameters (from 1 1 mu m to 100 mu m). The secondary flow was visualized by vortex cores and streamlines were seen wrapping around the cores. This depicted the swirling behavior as the flow shifted from a horizontal to vertical direction that influenced the particle deposition. The deposition efficiency for combinations of the pipe geometry, flow condition, and particle diameter were plotted against the particle Stokes number. The deposition profile demonstrated a sigmoidal shape and an arctan function is proposed as the unifying correlation for micron particle deposition in 90-degree bends, given as eta = 2/pi tan(-1) (aSt(b)). A limitation of the model is that it doesn't account for sedimentation effects, which could affect the particle locations at the bend entrance, particularly for particles >30 mu m. For particle 1000. Crown Copyright (C) 2019 Published by Elsevier B.V. All rights reserved.