Kimio OKUNO: "Evaluation of Ultrathin Si Growth Layer on W, Mo and Ta Surfaces with Field Emission and Field lon Microscopies" Jpn. J. Appl. Phys.34. 5783-5788 (1995)
Kimio OKUNO: "Evaluation of Ultrathin Si Growth Layer on W, Mo and Ta Surfaces with Field Emission and Field lon Microscopies" Jpn. J. Appl. Phys.34. 5783-5788 (1995)
复制标题
Kimio OKUNO:“利用场发射和场 lon 显微镜评估 W、Mo 和 Ta 表面上的超薄硅生长层”Jpn。
DOI:
--
复制
发表时间:
--
期刊:
影响因子:
--
通讯作者:
中科院分区:
文献类型:
--
作者: