Low-Temperature Relaxation of Polymers Probed by Photochemical Hole Burning
Low-Temperature Relaxation of Polymers Probed by Photochemical Hole Burning
复制标题
光化学烧孔探究聚合物的低温弛豫
DOI：
10.1021/bk-1998-0710.ch012
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发表时间：
1999
期刊：
影响因子：
--
通讯作者：
Bin
中科院分区：
文献类型：
--
作者：
S. Machida;Satomi Tanaka;K. Horie;Bin
光化学烧孔光谱被应用于估计聚合物的低温弛豫性质。研究了甲基丙烯酸酯聚合物、聚乙烯衍生物和具有芳香族基团的聚合物。温度循环实验检测到掺杂染料分子周围微环境的轻微和较大的变化。讨论了聚合物的弛豫行为与其化学结构的关系。对每种聚合物的低能激发模式也进行了估计和讨论。
Photochemical hole burning spectroscopy is applied to estimate the low-temperature relaxation properties of polymers. Methacrylate polymers, polyethylene derivatives, and polymers with aromatic groups were studied. Both slight and large changes of microenvironments around doped dye molecules are detected by temperature cycling experiment. Relaxation behavior of the polymers is discussed in relation to their chemical structures. The low-energy excitation mode of each polymer is also estimated and discussed.