Full-field fabric stress mapping by micro Raman spectroscopy in a yarn push-out test
Full-field fabric stress mapping by micro Raman spectroscopy in a yarn push-out test
复制标题
在纱线推出测试中通过显微拉曼光谱绘制全场织物应力图
DOI:
10.1364/ao.57.000924
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发表时间:
2018
期刊:
影响因子:
1.9
通讯作者:
Chen X.
中科院分区:
文献类型:
--
作者:
Lei Z. K.;Qin F. Y.;Fang Q. C.;Bai R. X.;Qiu W.;Chen X.