Room-Temperature-Sputtered Nanocrystalline Nickel Oxide as Hole Transport Layer for p-i-n Perovskite Solar Cells
Room-Temperature-Sputtered Nanocrystalline Nickel Oxide as Hole Transport Layer for p-i-n Perovskite Solar Cells
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DOI：
10.1021/acsaem.8b01263
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发表时间：
2018-11-01
影响因子：
6.4
通讯作者：
De Wolf, Stefaan
中科院分区：
文献类型：
--
作者：
Aydin, Erkan;Troughton, Joel;De Wolf, Stefaan
氧化镍（NiOx）具有良好的化学稳定性、高宽带光学透明度和高功函数，是钙钛矿太阳能电池（PSCs）中很有前途的空穴传输层（HTL）。使用溶液处理的NiOx已经报道了出色的功率转换效率（pce），然而，基于溶液的技术通常需要高温后退火才能达到NiOx所需的html特性，这危及其在许多应用中的使用，例如单片串联太阳能电池。为了解决这个问题，我们开发了室温溅射NiOx，并展示了PCE为17.6%（迟滞可以忽略不计）的p-i-n PSCs，这与使用溅射和退火NiOx而不掺杂杂原子的最佳PSCs相当。通过详细的表征和密度泛函理论（DFT）分析，我们探索了所获得的NiOx薄膜的电学和光学性质，并发现它们与该材料的特定缺陷化学密切相关。最后，考虑到它在钙钛矿/硅串联太阳能电池中的应用，我们发现在随机金字塔结构的硅片上直接溅射可以得到高度适形的NiOx薄膜。
Nickel oxide (NiOx) is a promising hole transport layer (HTL) for perovskite solar cells (PSCs), as it combines good chemical stability, high broadband optical transparency, and a high work function. Excellent power conversion efficiencies (PCEs) have already been reported using solution-processed NiOx However, solution-based techniques usually require high-temperature postannealing to achieve the required HTL properties of NiOx which jeopardizes its use for many applications, such as monolithic tandem solar cells. To resolve this issue, we developed room-temperature-sputtered NiOx and demonstrated p-i-n PSCs with 17.6% PCE (with negligible hysteresis), which are comparable to the best PSCs using sputtered and annealed NiOx without heteroatom doping. Through detailed characterization and density functional theory (DFT) analysis, we explored the electrical and optical properties of the obtained NiOx films and find that they are strongly linked with the specific defect chemistry of this material. Finally, in view of its use in perovskite/silicon tandem solar cells, we find that direct sputtering on random-pyramid textured silicon wafers results in highly conformal NiOx films.