Surface modification of silicate glasses by nanoimprint using nanostriped NiO thin film molds
Surface modification of silicate glasses by nanoimprint using nanostriped NiO thin film molds
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DOI：
10.1016/j.apsusc.2006.10.002
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发表时间：
2007-03
影响因子：
6.7
通讯作者：
S. Akiba;W. Hara;Takahiro Watanabe;A. Matsuda;M. Kasahara;M. Yoshimoto
中科院分区：
文献类型：
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作者：
S. Akiba;W. Hara;Takahiro Watanabe;A. Matsuda;M. Kasahara;M. Yoshimoto
采用纳米压印技术，在纳米条纹状NiO薄膜模具上对硅酸盐玻璃进行了纳米级表面改性。该模具具有由规则排列的直纳米凹槽组成的图案，该图案是通过高温退火沉积在原子台阶蓝宝石（α-Al 2 O3单晶）衬底上的Li掺杂NiO外延薄膜形成的。玻璃压印通过简单的步骤进行：加热（~ 600°C），压制（~ 1 kPa），然后在空气中冷却。从模具上转移的纳米压印玻璃表面显示出间隔为约80 nm、线宽为约70 nm、线高为约20 nm的多纳米线阵列。
Nanoscale surface modification of silicate glasses was examined by applying nanoimprint technique using a nanostriped NiO thin film mold. The mold had the pattern composed of regularly arranged straight nanogrooves, which was formed by high-temperature annealing of the Li-doped NiO epitaxial thin film deposited on the atomically stepped sapphire (α-Al2O3single crystal) substrate. The glass imprint was proceeded through the simple steps of heating (∼600°C), pressing (∼1kPa) and then cooling in air. The nanoimprinted glass surface transferred reversely from the mold exhibited the multi nanowire array having an interval of ∼80nm, wire width of ∼70nm, and wire height of ∼20nm.