Position- and size-controlled fabrication of iron silicide nanorods by electron-beam-induced deposition using an ultrahigh-vacuum transmission electron microscope
Position- and size-controlled fabrication of iron silicide nanorods by electron-beam-induced deposition using an ultrahigh-vacuum transmission electron microscope
复制标题
DOI：
10.1063/1.1922576
复制
发表时间：
2005-04
影响因子：
4
通讯作者：
Miyoko Tanaka;F. Chu;M. Shimojo;M. Takeguchi;K. Mitsuishi;K. Furuya
中科院分区：
文献类型：
--
作者：
Miyoko Tanaka;F. Chu;M. Shimojo;M. Takeguchi;K. Mitsuishi;K. Furuya
利用超高真空透射电子显微镜，在Si（111）衬底上，以五羰基铁为气源，采用电子束诱导沉积法制备了立方铁硅化物纳米棒阵列。纳米棒沿Si纳米棒110的方向之沿着排列。其长度可以通过改变照射时间来控制。结果表明，衬底表面附近的影响纳米棒的生长方向和位置。
We have fabricated arrays of nanorods of cubic iron silicide from iron pentacarbonyl gas source on Si(111) substrates by electron-beam-induced deposition at elevated temperature in an ultrahigh-vacuum transmission electron microscope. The nanorods are aligned along one of the Si⟨110⟩ directions. Their length could be controlled by changing the irradiation time. It was revealed that the vicinity of the substrate surface influences the growth direction and location of the nanorods.