Wavefield characterization of nearly diffraction-limited focused hard x-ray beam with size less than 10 nm.
Wavefield characterization of nearly diffraction-limited focused hard x-ray beam with size less than 10 nm.
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DOI:
10.1063/1.3509384
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发表时间:
2010-12
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影响因子:
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通讯作者:
T. Kimura;H. Mimura;Soichiro Handa;H. Yumoto;H. Yokoyama;S. Imai;S. Matsuyama;Y. Sano;K. Tamasaku;Y. Komura;Y. Nishino;M. Yabashi;T. Ishikawa;K. Yamauchi
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文献类型:
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作者:
T. Kimura;H. Mimura;Soichiro Handa;H. Yumoto;H. Yokoyama;S. Imai;S. Matsuyama;Y. Sano;K. Tamasaku;Y. Komura;Y. Nishino;M. Yabashi;T. Ishikawa;K. Yamauchi
In situ wavefront compensation is a promising method to realize a focus size of only a few nanometers for x-ray beams. However, precise compensation requires evaluation of the wavefront with an accuracy much shorter than the wavelength. Here, we characterized a one-dimensionally focused beam with a width of 7 nm at 20 keV using a multilayer mirror. We demonstrate that the wavefront can be determined precisely from multiple intensity profiles measured around the beamwaist. We compare the phase profiles recovered from intensity profiles measured under the same mirror condition but with three different aperture sizes and find that the accuracy of phase retrieval is as small as λ∕12.