Ultrastructural comparison of ion beam and radiofrequency plasma etching effects on biological tissue sections

Ultrastructural comparison of ion beam and radiofrequency plasma etching effects on biological tissue sections
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离子束和射频等离子体蚀刻对生物组织切片的超微结构比较

DOI:
10.1111/j.1365-2818.1984.tb00508.x
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发表时间:
1984
影响因子:
2
通讯作者:
J. Shelburne
J. Shelburne
中科院分区:
工程技术4区
文献类型:
--
作者:
R. W. Linton;M. E. Farmer;P. Ingram;J. Sommer;J. Shelburne

文献摘要

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比较了三种干法蚀刻技术(Ar+离子束、O2+离子束、O2射频无电极放电)对戊二醛固定的Epon包埋青蛙骨骼肌切片的超微结构的优先蚀刻和损伤。对未染色和染色(四氧化锇、乙酸双氧铀)切片进行 SEM 和 TEM 研究。观察到不同离子束或等离子体蚀刻技术的蚀刻效果不同。虽然氧等离子体蚀刻观察到电子致密结构(例如 Z 线、核异染色质)的选择性保留,但使用 O2+ 离子束轰击观察到这些组件的优先蚀刻。在足够高的离子剂量后,反应性 (O2+) 和惰性 (Ar+) 离子束溅射均观察到选择性蚀刻的 Z 线和抗蚀刻核仁。上述表明keV离子束照射下的选择性蚀刻更多地与物理溅射过程(动量转移)相关,而不是与入射离子的化学反应性相关。重金属后固定和染色对选择性蚀刻现象的性质没有定性影响。上述发现具有重要意义,因为它们可能影响蚀刻生物样本的电子和离子微探针测量。
Three dry etching techniques (Ar+ ion beam, O2+ ion beam, O2 radiofrequency electrodeless discharge) were compared with respect to preferential etching and damage to the ultrastructure of glutaraldehyde‐fixed Epon‐embedded frog skeletal muscle sections. SEM and TEM studies were performed on both unstained and stained (osmium tetroxide, uranyl acetate) sections. Etching effects were observed to differ for the various ion beam or plasma etching techniques. Whereas selective retention of electron dense structures (e.g. Z lines, nuclear heterochromatin) was observed for oxygen plasma etching, preferential etching of these components was observed using O2+ ion beam bombardment. Selectively etched Z lines and etch‐resistant nucleoli were observed for both reactive (O2+) and inert (Ar+) ion beam sputtering after sufficiently high ion doses. The above suggest that selective etching under keV ion beam irradiation is related more to physical sputtering processes (momentum transfer) than to the chemical reactivity of the incident ion. Heavy metal post‐fixation and staining had no qualitative effect on the nature of the selective etching phenomena. The above findings are significant in that they potentially influence both electron and ion microprobe measurements of etched biological specimens.