Kinetics of Magnesium Deposition and Stripping from Non-Aqueous Electrolytes
Kinetics of Magnesium Deposition and Stripping from Non-Aqueous Electrolytes
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非水电解质中镁沉积和溶出的动力学
DOI：
10.1021/acs.jpcc.7b06068
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发表时间：
2017
影响因子：
3.7
通讯作者：
B. Bartlett
中科院分区：
文献类型：
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作者：
A. Crowe;John L DiMeglio;Kyle K. Stringham;B. Bartlett
对之前报道的三种非水电解质溶液进行了电化学研究，以确定镁沉积溶解过程的动力学以及镁离子还原到块体金属工作电极上后所得的形态。在所检查的溶液中，THF 溶液（F6-叔丁醇）中的 1.2 M ((CF3)2CH3)COMgCl 和 0.2 M AlCl3 显示出最低的塔菲尔斜率，为 26.4 mV/dec，其次是 0.5 M RPhOMgCl 和 0.25 M AlCl3，其中 R = 2,4,6-Me3 的 THF 溶液（2,4,6-Me3 酚盐，32.1 mV/dec）和 0.4 M PhMgCl 和 0.2 M AlCl3 的 THF 溶液（APC，56.2 mV/dec）。氟化醇盐导致工作电极完全被镁覆盖，金属沿着垂直于电极表面的[100]方向生长。这种行为与芳香族电解质溶液相反，芳香族电解质溶液显示出较少的结晶镁沉积物和不完整的表面覆盖。通过电子显微镜、X 射线衍射和电化学方法的结合，我们表明这种零星沉积...
Three previously reported non-aqueous electrolyte solutions were investigated electrochemically to determine the kinetics of the Mg deposition–dissolution process as well as the resulting morphology after Mg-ion reduction onto a bulk metal working electrode. Of the solutions examined, the 1.2 M ((CF3)2CH3)COMgCl and 0.2 M AlCl3 in THF solution (F6-t-butoxide) shows the lowest Tafel slope of 26.4 mV/dec, followed by 0.5 M RPhOMgCl and 0.25 M AlCl3 where R = 2,4,6-Me3 in THF (2,4,6-Me3 phenolate, 32.1 mV/dec) and 0.4 M PhMgCl and 0.2 M AlCl3 in THF (APC, 56.2 mV/dec). The fluorinated alkoxide results in complete magnesium coverage of the working electrode, with the metal growing along the [100] direction, orthogonal to the electrode surface. This behavior is contrary to the aromatic-based electrolyte solutions, which show less crystalline Mg deposits and incomplete surface coverage. Through a combination of electron microscopy, X-ray diffraction, and electrochemical methods, we show that this sporadic depos...
DOI：
10.1039/c4cc07621d
发表时间：
2015-02-11
期刊：
Chemical communications (Cambridge, England)
影响因子：
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作者：
Liu T;Cox JT;Hu D;Deng X;Hu J;Hu MY;Xiao J;Shao Y;Tang K;Liu J
通讯作者：
Liu J