EFFECTS OF PROLONGED MENTAL WORK ON FUNCTIONAL BRAIN TOPOGRAPHY
EFFECTS OF PROLONGED MENTAL WORK ON FUNCTIONAL BRAIN TOPOGRAPHY
复制标题
DOI:
10.1016/0013-4694(90)90035-i
复制
发表时间:
1990-10-01
期刊:
影响因子:
--
通讯作者:
JEX, HR
中科院分区:
文献类型:
--
作者:
GEVINS, AS;BRESSLER, SL;JEX, HR
Topographic patterns of event-related covariance between electrodes were measured from subjects performing a difficult memory and fine-motor control task for 10-14 h. Striking changes occurred in the patterns after subjects performed the task for an average of 7-9 h, but before performance deteriorated. Pattern strength was reduced in a fraction-of-a second-long response preparation interval over midline precentral areas and over the entire left hemisphere. By contrast, pattern strength in a succeeding response inhibition interval was reduced over all areas. The pattern changed least in an interventing interval associated with visual-stimulus processing. This suggests that, in addition to the well-known global reduction in neuroelectric signal strength, functional neural networks are selectively affected by sustained mental work in specific fraction-of-a-second task intervals.