Surface structural analysis of h-BN/Ni(111) by X-ray photoelectron diffraction exited by Al-ka line and Cr-ka line

Surface structural analysis of h-BN/Ni(111) by X-ray photoelectron diffraction exited by Al-ka line and Cr-ka line
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Al-ka线和Cr-ka线激发的X射线光电子衍射分析h-BN/Ni(111)的表面结构

DOI:
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发表时间:
2006
期刊:
Surface and Interface Analysis (submitted)
影响因子:
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通讯作者:
Y.Nihei
Y.Nihei
中科院分区:
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文献类型:
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作者:
H.Mochiduki;K.Amano;M.Nojima;M.Owari;Y.Nihei

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