Development of Freeman Type Sputter Ion Source and Application for Coatings

Development of Freeman Type Sputter Ion Source and Application for Coatings
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弗里曼型溅射离子源的研制及其在涂料中的应用

DOI：
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发表时间：
1999
期刊：
影响因子：
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通讯作者：
Agawa Yoshiaki
Agawa Yoshiaki
中科院分区：
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文献类型：
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作者：
Matsumoto Takashi;K. Mimoto;T. Yoshikawa;M. Kiuchi;S. Gotô;M. Ohba;Agawa Yoshiaki

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研制了一种采用Freeman型溅射离子源的低能离子束沉积装置。研究具有明确能量的离子沉积下的薄膜形成过程是有用的。测量了Ti ~+、Fe ~+、C ~+离子的能量分布，从而估计了离子源的特性。利用弹性反冲检测分析（ERDA）和X射线衍射（XRD）对在该装置中制备的钛薄膜进行了检测。
A low-energy ion beam deposition apparatus with a Freeman type sputter ion source was developed. It is useful to investigate the process of thin film formation under deposition of ions with a well-defined energy. Energy distributions of Ti+, Fe+, C+ ions were measured so that we estimated characteristics of the ion source. A titanium thin film produced in this apparatus is examined by means of elastic recoil detection analysis (ERDA) and X-ray diffraction (XRD).