Generation of micrometer-sized patterns for microanalytical applications using a laser direct-write method and microcontact printing
Generation of micrometer-sized patterns for microanalytical applications using a laser direct-write method and microcontact printing
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DOI：
10.1021/ac9807621
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发表时间：
1998-11-15
影响因子：
7.4
通讯作者：
Whitesides, GM
中科院分区：
文献类型：
--
作者：
Grzybowski, BA;Haag, R;Whitesides, GM
本文介绍了一种程序，允许快速生成的弹性体主微接触印刷（μ CP）和这种技术的一个新的变种：控制下垂微接触印刷（CS μ CP）。使用工作在532 mm的低功率激光器（10 mW），在掺杂有染料（罗丹明B碱）的薄聚（甲基丙烯酸甲酯）膜中烧蚀所需图案。随后的图案转移到聚（二甲基硅氧烷）（PDMS）产生一个弹性体印章的μ CP或CS μ CP。在金的表面上印刷图案（线或沟槽），其特征尺寸小至5 μ m（μ CP），沟槽（但不是线）小至1 μ m（CS μ CP）。这项技术的能力，以产生功能系统证明了一个远离黄金微电极印刷在硅晶片和一个阵列的化学微反应器模压在PDMS中。以Ru（III）-（NH3）（6）Cl-3为基底，采用循环伏安法对电极阵列的性能进行了表征。使用微反应器作为容器来生长KNO 3晶体，其具有窄的分散尺寸和类似于15 μ m的最大尺寸。
This paper describes a procedure that allows the rapid generation of elastomeric masters for microcontact printing (mu CP) and for a new variant of this technique: controlled sagging microcontact printing (CS mu CP). Using a low-power laser (10 mW) operating at 532 mm, the desired pattern is ablated in a thin poly(methyl methacrylate) film doped with a dye (rhodamine B base). Subsequent pattern transfer into poly(dimethylsiloxane) (PDMS) produces an elastomeric stamp for either mu CP or CS mu CP. Printing on the surface of gold gives patterns (wires or trenches) with feature sizes as small as 5 mu m (mu CP) and trenches (but not wires) as smalll as 1 mu m (CS mu CP). The ability of this technique to generate functional systems was demonstrated with an away of gold minielectrodes printed on a silicon wafer and an array of chemical microreactors molded in PDMS. The performance of the electrode array was characterized using cyclic voltammetry with Ru(III)-(NH3)(6)Cl-3, as the substrate. Microreactors were used as vessels to grow crystals of KNO3 with a narrow dispersion in sizes and with largest dimensions of similar to 15 mu m.