Self-assembled organic monolayers as high-resolution resists in rapid nonlinear processing with single femtosecond laser pulses
Self-assembled organic monolayers as high-resolution resists in rapid nonlinear processing with single femtosecond laser pulses
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自组装有机单层作为高分辨率抗蚀剂，用于单飞秒激光脉冲的快速非线性处理
DOI：
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发表时间：
2010
期刊：
影响因子：
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通讯作者：
N. Hartmann
中科院分区：
文献类型：
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作者：
Mareike Mathieu;S. Franzka;J. Koch;B. Chichkov;N. Hartmann
研究了在室温下，波长为800 nm，τ<30 fs的飞秒激光对金膜硅衬底上烷基乙醇单分子膜的图形化.单脉冲处理允许选择性地去除有机涂层。随后，通过在亚铁氰化物/亚铁氰化物溶液中的湿法蚀刻实现图案转移到金膜中。如所展示的，无毛刺图案化可以在从高于2 J/cm 2到低至0.5J/cm 2的极宽范围的激光脉冲能量密度上进行。此外，在低注量下，低至λ/5的亚波长处理是可行的。特别地，在1/e激光光斑直径约为1 μm的条件下，可以制备出直径为160 nm、台阶边缘小于80 nm的孔。这些结果强调了有机单分子膜作为快速非线性飞秒激光加工中的高分辨率抗蚀剂的前景。
Femtosecond laser patterning of alkanethiol monolayers on gold-coated silicon substrates at λ=800 nm, τ<30 fs and ambient conditions has been investigated. Single-pulse processing allows one to selectively remove the organic coating. Subsequently, pattern transfer into the gold film via wet etching in ferri-/ferrocyanide solution is achieved. As demonstrated, burr-free patterning can be carried out over an extremely wide range of laser pulse fluences from above 2 J/cm2 down to 0.5 J/cm2. Moreover, at low fluences, sub-wavelength processing down to λ/5 is feasible. In particular, at a 1/e laser spot diameter of about 1 μm, holes with diameters of 160 nm and step edges below 80 nm are fabricated. These results emphasize the prospects of organic monolayers as high-resolution resists in rapid nonlinear femtosecond laser processing.