Non-photolithographic pattern transfer for fabricating pen-shaped microneedle structures
Non-photolithographic pattern transfer for fabricating pen-shaped microneedle structures
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DOI：
10.1088/0960-1317/14/11/005
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发表时间：
2004-11
影响因子：
2.3
通讯作者：
M. Shikida;M. Ando;Y. Ishihara;T. Ando;Kazuo Sato;K. Asaumi
中科院分区：
文献类型：
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作者：
M. Shikida;M. Ando;Y. Ishihara;T. Ando;Kazuo Sato;K. Asaumi
我们发展了一种新的笔形微针结构的制造工艺，采用非对称图案转移。该工艺是各向异性湿法蚀刻和使用锯的切割技术的组合。该方法具有这样的优点，其中通过改变在切割锯过程中形成的凹槽轮廓，针直径容易改变。我们制造了用于医疗应用的密集阵列中的笔形针结构。在实验中，针的高度大于200 µm，并且间距约为200 µm。针的宽度范围为10至30 µm。针尖处的半径小于100 nm。
We developed a new fabrication process for pen-shaped microneedle structures by using non-photolithographic pattern transfer. The process is a combination of anisotropic wet etching and a dicing technology that uses a saw. The process has an advantage, in which the needle diameter is easily changed by altering the groove profile formed in the dicing-saw process. We fabricated pen-shaped needle structures in a dense array for medical applications. The needle height was larger than 200 µm, and the pitch distance was about 200 µm in the experiments. The width of the needle ranged from 10 to 30 µm. The radius at the needle tip was less than 100 nm.