Radicals Are Required for Thiol Etching of Gold Particles.
Radicals Are Required for Thiol Etching of Gold Particles.
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DOI：
10.1002/anie.201502934
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发表时间：
2015-08-03
期刊：
影响因子：
--
通讯作者：
Ackerson CJ
中科院分区：
文献类型：
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作者：
Dreier TA;Ackerson CJ
在金颗粒的合成和分析中使用具有过量硫醇配体的金的蚀刻。机械地，用过量硫醇蚀刻金的过程是不透明的。以前的研究间接地考虑了氧在金的硫醇盐蚀刻中的作用。在这里，我们表明，氧或自由基引发剂是一个必要的组成部分，有效地蚀刻金的硫醇盐。在氧气存在下，自由基清除剂对蚀刻过程的减弱，以及在惰性气氛下自由基引发剂对活性的恢复，强烈暗示了氧自由基。这些数据使我们提出了一种原子机制，其中氧自由基引发蚀刻过程。
Etching of gold with excess thiol ligand is used in both synthesis and analysis of gold particles. Mechanistically, the process of etching gold with excess thiol is opaque. Previous studies have obliquely considered the role of oxygen in thiolate etching of gold. Herein, we show that oxygen or a radical initator is a necessary component for efficient etching of gold by thiolates. Attenuation of the etching process by radical scavengers in the presence of oxygen, and the restoration of activity by radical initiators under inert atmosphere, strongly implicate the oxygen radical. These data led us to propose an atomistic mechanism in which the oxygen radical initiates the etching process.