SIMULATING PRESSURE DISTRIBUTION ON LENS RELEVANT TO FLUID INJECTION FOR IMMERSION LITHOGRAPHY
SIMULATING PRESSURE DISTRIBUTION ON LENS RELEVANT TO FLUID INJECTION FOR IMMERSION LITHOGRAPHY
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DOI：
10.5739/isfp.2008.847
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发表时间：
2008
期刊：
影响因子：
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通讯作者：
Wen-yu Chen;Xin Fu;Huayong Yang
中科院分区：
文献类型：
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作者：
Wen-yu Chen;Xin Fu;Huayong Yang
已经提出浸没光刻作为将光学光刻分辨率提高到32nm的方法。该概念背后的前提是通过插入高折射率液体代替当前填充差距的低折射率空气来增加透镜和晶片之间的空间中的折射率。在扫描和曝光过程中，浸没液体以一定的入口压力和角度注入晶片和透镜之间的空间。因为液体在光刻工艺期间将充当透镜组件，所以其必须保持高的均匀光学质量。光学退化的一个来源可能是由于流体流场中的压力分布不均匀性引起的透镜畸变。因此，与透镜直接接触的流场边界上的压力分布的任何偏差都可能破坏均匀的光路。流场流型进行了讨论，相应的分配端口号。给出了考虑流体喷射速度、点胶口数量和方向角等因素影响下的透镜法向压力、切向压力和喷射流量的数值模拟结果。
Immersion lithography has been proposed as a method for improving optical lithography resolution to 32 nm. The premise behind the concept is to increase the refraction index in the space between the lens and wafer by insertion of a high refractive index liquid in place of the low refractive index air that currently fills the gap. During the scanning and exposure process, immersion liquid is injected into the space between wafer and lens with certain inlet pressure and angle. Because the liquid will act as a lens component during the lithographic process, it must maintain high uniform optical quality. One source of optical degradation may be due to lens distortion caused by the pressure distribution nonuniformity in the fluid flow field. Consequently, any deviations of pressure distribution on flow field boundary in direct contact with lens may damage the uniform optical path. Three-dimensional computational fluid dynamics models were created to assess the pressure distribution characteristics relevant to flow rates and injecting angles of immersion liquid. Flow field stream patterns were discussed corresponding to dispense port numbers. The numerical simulation results were presented, featuring lens normal and shear pressure and injection flow, considering fluid injecting velocity, dispense ports quantity, and direction angles.