Versatile nanosphere lithography technique combining multiple-exposure nanosphere lens lithography and nanosphere template lithography
Versatile nanosphere lithography technique combining multiple-exposure nanosphere lens lithography and nanosphere template lithography
复制标题
结合多次曝光纳米球透镜光刻和纳米球模板光刻的多功能纳米球光刻技术
DOI：
10.3788/col201715.062201
复制
发表时间：
2017-03
影响因子：
3.5
通讯作者：
Bi Wen'gang
中科院分区：
文献类型：
--
作者：
Zhang Yonghui;Zhang Zihui;Geng Chong;Xu Shu;Wei Tongbo;Bi Wen'gang
介绍了一种结合了多次曝光纳米球透镜光刻（MENSLL）和纳米球模板光刻（NSTL）优点的多功能纳米球复合光刻（NSCL）。通过控制好显影、洗涤和干燥过程，可以使纳米球单分子层在显影和洗涤后很好地保留在基底上。因此，NSTL可以基于MENSLL来执行以制造纳米环、纳米柱和分级多个结构。图案的尺寸和形状可以通过使用干法蚀刻和调整倾斜角度来收缩纳米球而系统地调整。它是一种自然的纳米图案排列过程，由于其低成本、简单和多功能性，在纳米科学领域具有巨大的潜力。
A versatile nanosphere composite lithography (NSCL) combining both the advantages of multiple-exposure nanosphere lens lithography (MENSLL) and nanosphere template lithography (NSTL) is demonstrated. By well controlling the development, washing and the drying processes, the nanosphere monolayer can be well retained on the substrate after developing and washing. Thus the NSTL can be performed based on MENSLL to fabricate nanoring, nanocrescent and hierarchical multiple structures. The pattern size and the shape can be systemically tuned by shrinking nanospheres by using dry etching and adjusting the tilted angle. It is a natural nanopattern alignment process and possesses a great potential in the scope of nano-science due to its low cost, simplicity, and versatility for variuos nano-fabrications.
影响因子：
4.1
作者：
R. Stephenson
通讯作者：
R. Stephenson