Temperature and thickness dependence of magnetic moments in NiO epitaxial films
Temperature and thickness dependence of magnetic moments in NiO epitaxial films
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DOI：
10.1103/physrevb.57.11623
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发表时间：
1998-05-01
影响因子：
3.7
通讯作者：
Iacobucci, S
中科院分区：
文献类型：
--
作者：
Alders, D;Tjeng, LH;Iacobucci, S
我们表明，线性偏振X射线吸收光谱可用于测量NiO薄膜中磁矩的温度和厚度依赖性。我们证明了长程有序和最近邻自旋-自旋关联都可以被揭示出来。研究了在MgO（100）衬底上外延生长的厚度分别为5、10和20单层的NiO（100）薄膜。尼尔温度被发现是强烈降低，从散装值，即使是20单层膜。
We show that linear polarized x-ray-absorption spectroscopy can be used to measure the temperature and thickness dependence of magnetic moments in NiO thin films. We demonstrate that both the long-range order and the nearest-neighbor spin-spin correlations can be revealed. NiO (100) films with thicknesses of 5, 10, and 20 monolayers epitaxially grown on MgO (100) are studied. The Neel temperature is found to be strongly reduced from the bulk value even for the 20 monolayer film.