Investigation on the structure and properties of AlxCr1−xN coatings deposited by reactive magnetron co-sputtering
Investigation on the structure and properties of AlxCr1−xN coatings deposited by reactive magnetron co-sputtering
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DOI：
10.1016/j.jallcom.2010.04.155
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发表时间：
2010-07
影响因子：
6.2
通讯作者：
X. Wang;Lei Wang;Zhengbing Qi;G. Yue;Yuechao Chen;Zhoucheng Wang;D. Peng
中科院分区：
文献类型：
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作者：
X. Wang;Lei Wang;Zhengbing Qi;G. Yue;Yuechao Chen;Zhoucheng Wang;D. Peng
Al-rich AlxCr1−xN coatings have been deposited by reactive magnetron co-sputtering using a direct current (DC) power source to Al and a radio frequency (RF) power source to Cr target. The crystal structure, chemical composition, surface morphology, thickness and hardness of the AlxCr1−xN coatings which were prepared at various N2flow rates and working pressures have been systemically investigated. The results show a strong effect of N2flow rates and working pressures on the phase composition and microstructure as well as the Al content in AlxCr1−xN coatings. The present results also show Al contents play an important role in the hardness of the AlxCr1−xN coatings, which demonstrates the highest hardness for Al contents close to the maximum solubility in cubic AlxCr1−xN.
