Growth-induced uniaxial anisotropy in grazing-incidence deposited magnetic films
Growth-induced uniaxial anisotropy in grazing-incidence deposited magnetic films
复制标题
掠入射沉积磁性薄膜中生长引起的单轴各向异性
DOI：
10.1063/1.1312865
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发表时间：
2000
影响因子：
4
通讯作者：
B. Poelsema
中科院分区：
文献类型：
--
作者：
S. Dijken;G. D. Santo;B. Poelsema
利用磁光Kerr效应研究了Cu（001）衬底上外延Co薄膜的面内磁各向异性随沉积角度的变化。Co的掠入射分子束外延已被发现导致单轴磁各向异性，其强度随沉积角度的增加而增加。测得的磁各向异性与生长过程中形成的细长吸附原子结构有关。沉积动力学的计算表明，单轴磁各向异性和表面形貌起源于入射原子通量的重新分配。这种重新分布是由入射原子和衬底原子之间的长程吸引力引起的。
The deposition angle dependence of the in-plane magnetic anisotropy in ultrathin Co films on Cu(001) has been investigated by using the magneto-optic Kerr effect. Grazing-incidence molecular beam epitaxy of Co has been found to result in a uniaxial magnetic anisotropy, whose strength increases with increasing deposition angle. The measured magnetic anisotropy is related to the formation of elongated adatom structures during growth. Calculations of the deposition dynamics reveal that the uniaxial magnetic anisotropy and surface morphology originate from a redistribution of incident atom flux. This redistribution is caused by long-range attractive forces between incident atoms and substrate atoms.