CHEMICAL REACTION BETWEEN PLASMA AND SURFACE

CHEMICAL REACTION BETWEEN PLASMA AND SURFACE
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等离子体和表面之间的化学反应

DOI:
10.1380/jsssj.3.2
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发表时间:
1982
期刊:
影响因子:
--
通讯作者:
O. Matsumoto
O. Matsumoto
中科院分区:
--
文献类型:
--
作者:
O. Matsumoto

文献摘要

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相似文献

为了理解等离子体与固体表面相互作用的化学过程,研究了等离子体态的形成和反应。用发射光谱、质谱和电探针技术确定了等离子体的状态,并以钛、钢和硅等金属的氮和氮氢等离子体渗氮为例进行了讨论。在氮等离子体中观察到的主要物种是处于激发态的氮分子和分子离子。通过向氮等离子体中加入氢,形成氮-氢分子。在每一个案例中。通过加入氢气,氮化反应被显著地交换。对氢的加入效果进行了简要的讨论。
For understanding chemical process in the interaction between a plasma and a solid surface, the formation and reaction of the plasma state is studied. The plasma state was identified by the emission and mass spectroscopies and the electrical probe techniques.The Nitriding of metals, such as titanium, steel and silicon, with nitrogen and nitrogen-hydrogen plasmas was discussed as an example. The main species observed in the nitrogen plasma were nitrogen molecules and molecular ions in excited states. By the addition of hydrogen into the nitrogen plasma, nitrogen-hydrogen molecules were formed. In every case. the nitriding reaction was considerably exchanged by the addition of hydrogen. The effect of the addition of hydrogen is briefly discussed.