Periodic layered structure in Ni3Si/Zn diffusion couples
Periodic layered structure in Ni3Si/Zn diffusion couples
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Ni3Si/Zn 扩散偶中的周期性层状结构
DOI:
10.1016/j.scriptamat.2008.04.015
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发表时间:
2008-08-01
影响因子:
6
通讯作者:
Li, Zhi
中科院分区:
文献类型:
--
作者:
He, Meng;Su, Xuping;Li, Zhi
During the reaction in Ni3Si/Zn ternary diffusion couples at temperatures between 390 and 450 degrees C the formation of a periodic layered structure was observed. The periodic layered structure was determined by using scanning electron microscopy coupled with energy dispersive X-ray spectroscopy and X-ray diffraction. It consists of parallel alternating layers: a ternary phase T (Ni(2)Zn(3)si) layer and the gamma (NiZn3) phase layer. A model describing the formation of such a layered structure in the Ni3Si/Zn system is presented. (C) 2008 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.