Roughness of molecularly thin perfluoropolyether polymer films
Roughness of molecularly thin perfluoropolyether polymer films
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分子薄全氟聚醚聚合物薄膜的粗糙度
DOI：
10.1063/1.1326484
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发表时间：
2000
影响因子：
4
通讯作者：
K. Leach
中科院分区：
文献类型：
--
作者：
M. Toney;C. M. Mate;K. Leach
X射线反射率已被用来测量硅衬底和碳涂层上的全氟聚醚（PFPE）聚合物膜的粗糙度。对于光滑硅上的PFPE，我们发现PFPE-空气界面的均方根粗糙度随着PFPE厚度从5 A增加到33 A而从2 A缓慢增加到4 A。这种增加是一致的毛细波粗糙的聚合物膜，但不符合目前的理论，为去湿的聚合物膜。对于PFPE在无定形氢化碳的粗糙表面上，我们发现PFPE聚合物使表面光滑，均方根粗糙度从9降低到4A。我们还讨论了磁盘驱动器技术的限制，这些结果的影响。
X-ray reflectivity has been used to measure the roughness of perfluoropolyether (PFPE) polymer films on silicon substrates and carbon overcoats. For PFPE on smooth silicon, we find that the rms roughness of the PFPE–air interface increases slowly from about 2 to 4 A as PFPE thickness increases from 5 to 33 A. This increase is consistent with capillary waves roughening the polymer film, but inconsistent with current theories for the dewetting of polymer films. For PFPE on the rougher surface of amorphous hydrogenated carbon, we find that the PFPE polymer smoothes the surface with the rms roughness decreasing from 9 to 4 A. We also discuss the implications of these results on the limits of disk drive technology.