In Situ Characterization of the Self-Assembly of a Polystyrene-Polydimethylsiloxane Block Copolymer during Solvent Vapor Annealing
In Situ Characterization of the Self-Assembly of a Polystyrene-Polydimethylsiloxane Block Copolymer during Solvent Vapor Annealing
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DOI:
10.1021/acs.macromol.5b02174
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发表时间:
2015-12-08
期刊:
影响因子:
5.5
通讯作者:
Ross, C. A.
中科院分区:
文献类型:
--
作者:
Bai, W.;Yager, K. G.;Ross, C. A.
Grazing incidence X-ray scattering was used to follow the microphase separation during room-temperature solvent annealing of films of high interaction parameter cylinder-forming 16 kg/mol polystyrene-b-polydimethylsiloxane block copolymer in a toluene heptane mixed solvent vapor. Microphase separation was observed for swelling ratios above 1.2, but swelling ratios above 1.9 caused the films to disorder. The films exhibited a thickness-dependent microdomain reorientation during annealing, with the initial out-of-plane cylinder orientation converting to an in-plane orientation as a result of preferential surface interactions. Drying led to a reduction in the out-of-plane cylinder spacing, with slower drying leading to greater deswelling and larger distortion of the hexagonal lattice.