Photopatterning of indomethacin thin films: a solvent-free vapor-deposited photoresist
Photopatterning of indomethacin thin films: a solvent-free vapor-deposited photoresist
复制标题
吲哚美辛薄膜的光刻图案：无溶剂气相沉积光刻胶
DOI：
10.1021/acsami.5b05361
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发表时间：
2015
影响因子：
9.5
通讯作者：
Christopher K. Ober
中科院分区：
文献类型：
--
作者：
Katherine L. Camera;Jaritza Gomez-Zayas;Daisuke Yokoyama;Mark D. Ediger;Christopher K. Ober
我们报告消炎痛作为一种光致抗蚀剂，可以干沉积（以及旋涂），并在弱碱性溶液中显影。这是首次报道的吲哚美辛作为抗蚀剂材料的图案化。通过深紫外光刻实现了纳米尺度的图案，并研究了潜在的图案化机制。
We report indomethacin as a photoresist that can be dry-deposited (as well as spin-coated), and developed in weak aqueous base. This is the first reported patterning of indomethacin as a resist material. Nanometer-scale patterns were achieved through DUV photolithography and the underlying patterning mechanism was investigated.