Fabrication of high aspect ratio 100 nm metallic stamps for nanoimprint lithography using proton beam writing
Fabrication of high aspect ratio 100 nm metallic stamps for nanoimprint lithography using proton beam writing
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DOI：
10.1063/1.1773933
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发表时间：
2004-07-19
影响因子：
4
通讯作者：
Watt, F
中科院分区：
文献类型：
--
作者：
Ansari, K;van Kan, JA;Watt, F
我们报道了一种利用质子束写入技术与氨基磺酸镍溶液电镀相结合的方法，制备了100 nm宽、2 nm深的高质量无空洞高纵横比金属印章。质子束写入是一种一步直接写入过程，能够制造具有高纵横比垂直壁和光滑侧面的纳米结构，因此具有三维（3D）印章制造的理想特性。纳米压痕和原子力显微镜测量表明，制备的冲压件镍表面的硬度和侧壁粗糙度分别为5 GPa和7 nm。制造的100纳米3D邮票已被用于将测试图案转移到聚（甲基丙烯酸甲酯）薄膜上，并自旋涂覆在硅衬底上。质子束写入与电镀相结合，为制造高质量的金属3D纳米印花提供了一种极具潜力的工艺。(C) 2004年美国物理研究所。
We report a way of fabricating high-quality void-free high-aspect-ratio metallic stamps of 100 nm width and 2 mum depth, using the technique of proton beam writing coupled with electroplating using a nickel sulfamate solution. Proton beam writing is a one-step direct-write process with the ability to fabricate nanostructures with high-aspect-ratio vertical walls and smooth sides, and as such has ideal characteristics for three-dimensional (3D) stamp fabrication. Nanoindentation and atomic force microscopy measurements of the nickel surfaces of the fabricated stamp show a hardness and side-wall roughness of 5 GPa and 7 nm, respectively. The fabricated 100 nm 3D stamps have been used to transfer test patterns into poly(methylmethacrylate) films, spin coated onto a silicon substrate. Proton beam writing coupled with electroplating offers a process of high potential for the fabrication of high quality metallic 3D nanostamps. (C) 2004 American Institute of Physics.