Structural study of near-field ablation close to plasmon-resonant nanotriangles
Structural study of near-field ablation close to plasmon-resonant nanotriangles
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DOI：
10.2351/1.4731304
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发表时间：
2012-07
影响因子：
2.1
通讯作者：
A. Kolloch;P. Leiderer;S. Ibrahimkutty;D. Issenmann;A. Plech
中科院分区：
文献类型：
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作者：
A. Kolloch;P. Leiderer;S. Ibrahimkutty;D. Issenmann;A. Plech
等离子体纳米尺度物体附近的光学近场显示出电场的显著增强，并且被定位到远小于光的波长的尺寸。作者表明，由飞秒激光脉冲的近场增强引起的烧蚀过程图案化金纳米三角形下方的衬底是一种以低于20 nm的分辨率成像近场分布的方法。通过脉冲X射线散射研究的烧蚀机制揭示了该过程的非热性质。
The optical near fields in close vicinity to plasmonic nanoscale objects show a considerable enhancement of the electrical field and are localized to dimensions much less than the wavelength of light. The authors show that an ablation process caused by the near-field enhancement of femtosecond laser pulses pattern the substrate below gold nanotriangles is a way to image the near-field distribution with a resolution below 20 nm. The mechanism of ablation studied by pulsed x-ray scattering reveals the nonthermal nature of the process.