Elaboration and characterization of thin films of TiO2 prepared by sol-gel process
Elaboration and characterization of thin films of TiO2 prepared by sol-gel process
复制标题
DOI：
10.1016/s0040-6090(02)00714-9
复制
发表时间：
2002-10-15
期刊：
影响因子：
2.1
通讯作者：
Bach, S
中科院分区：
文献类型：
--
作者：
Legrand-Buscema, C;Malibert, C;Bach, S
采用溶胶-凝胶法在硅衬底上制备了TiO 2薄膜。在乙酸存在下，用醇盐Ti（O-nBu）（4）和乙酰丙酮作为螯合剂，合成了这种氧化物的非常稳定的溶胶。对于单层薄膜，膜厚度根据溶胶的浓度从20至100 nm变化。在Si（100）衬底上制备的薄膜的结构表征表明，在400 ℃下加热2 h后，形成了TiO_2纳米晶相。金红石相的外观取决于所用的基材。例如，在干凝胶中，金红石相在700 ℃出现，而衬底Si（100）的存在使金红石相稳定到800 ℃。退火温度对晶粒尺寸的影响已得到证实。事实上，在400 ℃下退火的薄膜中发现的颗粒尺寸等于4 nm，在800 ℃下增加到约40 nm。(C)2002 Elsevier Science BN版权所有。
Sol-gel TiO2 thin films have been obtained by a dip-coating method on a silicon substrate. Very stable sols of this oxide were synthesized using the alkoxide Ti(O-nBu)(4) in the presence of acetic acid and using acetylacetone as a chelating agent. The film thickness varied from 20 to 100 nm depending on the concentration of the sol for a monolayer thin film. The structural characterization of this film on substrate Si(100) shows that the titanium oxide anatase phase is formed after heating at 400 degreesC for 2 h. The appearance of the rutile phase depends on the substrate used. For example, the rutile phase appeared at 700 degreesC in the xerogel while the presence of substrate Si(100) stabilizes the anatase phase up to 800 degreesC. The influence of the annealing temperature on grain size has been evidenced. Indeed, the size of the particles found equal to 4 nm for films annealed at 400 degreesC, increasing to around 40 nm at 800 degreesC. (C) 2002 Elsevier Science BN All rights reserved.