Electrodeposition of Semiconductors
Electrodeposition of Semiconductors
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DOI：
10.1002/9780470602638.ch14
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发表时间：
2011-02
期刊：
影响因子：
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通讯作者：
T. Schlesinger;K. Rajeshwar;N. Tacconi
中科院分区：
文献类型：
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作者：
T. Schlesinger;K. Rajeshwar;N. Tacconi
多年来，人们对半导体的电沉积进行了详细的研究，并进行了大量的演示。这一努力的主要动机是，电沉积是一种相对简单和廉价的沉积技术，可以很容易地扩大规模。一般来说，这种方法沉积的薄膜不具有分子束外延或化学气相沉积等技术所沉积的单晶外延薄膜的结晶完整性或低水平的电活性杂质。然而，在需要大面积半导体的应用中，例如光伏发电或防腐，而不是集成电路制造，低成本和相对较低的材料要求使这种沉积技术在最终商业化方面具有吸引力。此外，对于太阳能电池的应用，电沉积允许通过控制外加电位、pH和镀液温度等生长参数来通过成分调制来轻松地改变带隙和晶格常数。因此，至少在原则上可以很容易地生长大面积的串联电池，其设计用于最有效地转换太阳光谱。Paunovic和Schlesinger详细讨论了电解槽的典型布置以及与沉积过程相关的基本电化学和热力学[1]。由于大量半导体的电沉积已经取得了不同程度的成功，本章将重点介绍在半导体层沉积领域所取得的成就的历史发展。在每一种情况下，都试图指出技术的状态。文中提供了简短的摘要以及所使用的一些方法的细节，并提供了大量参考文献的清单。
The electrodeposition of semiconductors has been investigated in detail and demonstrated by a large number of workers over many years. This effort is primarily motivated by the fact that electrodeposition is a relatively simple and inexpensive deposition technology that may be scaled up easily. In general, the films deposited by this method do not possess the crystalline perfection or low levels of electrically active impurities of single-crystal epitaxial films deposited by techniques such as molecular beam epitaxy or chemical vapor deposition. Nonetheless, in applications where large areas of semiconductors are required, such as photovoltaic power generation or corrosion protection as opposed to integrated circuit fabrication, the low cost and comparatively low material demands make this deposition technology attractive in terms of ultimate commercialization. In addition, for application in solar cells electrodeposition allows one to easily alter both the bandgap and lattice constant by composition modulation through the control of growth parameters such as applied potential, pH, and temperature of the bath. Thus, it is at least in principle possible to easily grow large areas of tandem cells designed for the most efficient conversion of the solar spectrum. Typical arrangements for electrolytic cells as well as the fundamental electrochemistry and thermodynamics associated with the deposition process are discussed in detail by Paunovic and Schlesinger [1]. Since a large number of semiconductors have been electrodeposited with varying degrees of success, this chapter will focus on the historical development of what has been accomplished in the area of the deposition of semiconductor layers. An attempt is made to indicate the state of the art in each instance. Short summaries as well as the particulars of some of the methods used and an extensive list of references to the literature are provided.