Effect of pulsed current on the properties of electrodeposited chromium
Effect of pulsed current on the properties of electrodeposited chromium
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发表时间：
1989
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通讯作者：
T. Pearson;K. Dennis
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作者：
T. Pearson;K. Dennis
电流脉冲降低了硫酸盐催化浴中沉积的铬的内应力，并减少或消除了开裂。亮度降低，但阴极效率提高。在一定的条件下，可诱导氢化铬共沉积。当电流以100 Hz的频率脉冲时，两种专利浴的阴极效率降低，但在更高的频率下增加。三种镀液的镀层硬度均随脉冲频率的增加而增加
Current pulsing reduced the internal stress of chromium deposited in sulfate-catalyzed baths and reduced or eliminated cracking. Brightness was reduced but cathode efficiency was improved. Chromium hydride codeposition was induced under some conditions. The cathode efficiency of two proprietary baths was reduced when the current was pulsed at a frequency of 100 Hz, but increased at higher frequencies. The hardness of deposits from all of the three baths used increased with increasing pulse frequency