Comparison of different source concepts for EUVL
Comparison of different source concepts for EUVL
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EUVL 不同来源概念的比较
DOI：
10.1117/12.436650
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发表时间：
2001
期刊：
影响因子：
--
通讯作者：
W. Neff
中科院分区：
文献类型：
--
作者：
R. Lebert;K. Bergmann;L. Juschkin;O. Rosier;W. Neff
有一些候选者被讨论为 EUV 光刻的潜在高功率 EUV 源。激光产生和放电产生的等离子体是最有前途的。原则上，最有效的稳态等离子体可以根据等离子体温度和密度来定义。然而，实际EUV源的转换效率主要取决于等离子体产生和加热的效率以及发射阶段的动力学。实现最高效 EUV 源的不同方法意味着不同的加热机制、不同的等离子体几何形状、不同的等离子体密度和不同的时间尺度。此外，每种方法都有各自的技术方面，这些方面会影响效率和实现的技术机会。基于对等离子体生成的基本方面的讨论和技术问题，提出了比较不同 EUV 源概念的通用方法。
There are some candidates discussed as potential high power EUV sources for EUV lithography. Laser produced and discharge produced plasmas are most promising. In principle, the most efficient steady state plasma can be well defined with respect to plasma temperature and density. However, the conversion efficiency of a practical EUV source is mainly determined by the efficiency of plasma generation and heating and by the dynamics during the emitting phase. The different approaches to achieve the most efficient EUV source imply different heating mechanisms, different plasma geometries, different plasma densities and different time scales. Moreover, each approach has individual technical aspects that influence the efficiency and the technical chances of realization. A general approach for comparing different EUV source concepts is presented based on a discussion of fundamental aspects of the plasma generation and based on technical issues.