Raman Analysis and Electrochemical Reduction of Silicate Ions in Molten NaCl-CaCl2
Raman Analysis and Electrochemical Reduction of Silicate Ions in Molten NaCl-CaCl2
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DOI：
10.1149/1945-7111/abf4b2
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发表时间：
2021-04-01
影响因子：
3.9
通讯作者：
Nohira, Toshiyuki
中科院分区：
文献类型：
--
作者：
Ma, Yuanjia;Yamamoto, Takayuki;Nohira, Toshiyuki
研究了1023 K时不同O2-浓度下NaCl-CaCl 2共晶熔体中硅酸根离子的形态和在固体石墨电极上的电化学还原行为。在不同的O2-/SiO2比（r（O2-/SiO2））r（O2-/SiO2）= 1.0，和SiO 44-为r（O2-/SiO2）= 1.5和2.0熔体中的硅酸盐离子物种。从循环伏安法，XRD和SEM分析，电化学还原表明SiO 32-和SiO 44-在更负的1.0 V和0.80 V相对于Na+/Na，分别。在0.50 V下，在r（O2-/SiO2）= 1.0、1.5和2.0的所有熔融盐中确认了CaSi 2的形成。纯Si沉积的电位范围在r（O2-/SiO2）= 1.0和1.5的熔盐中几乎相同。(c)2021年，任作者。由IOP Publishing Limited代表电化学学会出版。这是一篇开放获取的文章，根据知识共享署名非商业性禁止衍生4.0许可证（CC BYNC-ND，http：//creativecommons.org/licenses/by-nc-nd/4.0/）的条款分发，该许可证允许在任何媒体上进行非商业性的重用，分发和复制，前提是原始作品没有以任何方式改变并正确引用。如需获得商业再利用许可，请发送电子邮件至：permissions@ioppublishing.org。
This study investigated the ionic species and electrochemical reduction of silicate ions at a solid graphite electrode in molten NaCl-CaCl2 eutectic melts with various concentrations of O2- ion at 1023 K. Silicate ion species in the melts with various O2-/SiO2 ratios (r(O2-/SiO2)) r(O2-/SiO2) = 1.0, and SiO44- for r(O2-/SiO2) = 1.5 and 2.0. From cyclic voltammetry, XRD, and SEM analyses, electrochemical reduction was indicated for SiO32- and SiO44- at more negative than 1.0 V and 0.80 V vs Na+/Na, respectively. Formation of CaSi2 was confirmed at 0.50 V in all molten salts with r(O2-/SiO2) = 1.0, 1.5, and 2.0. The potential ranges for pure Si deposition are almost the same in molten salts with r(O2-/SiO2) = 1.0 and 1.5.(c) 2021 The Author(s). Published on behalf of The Electrochemical Society by IOP Publishing Limited. This is an open access article distributed under the terms of the Creative Commons Attribution Non-Commercial No Derivatives 4.0 License (CC BYNC-ND, http://creativecommons.org/licenses/by-nc-nd/4.0/), which permits non-commercial reuse, distribution, and reproduction in any medium, provided the original work is not changed in any way and is properly cited. For permission for commercial reuse, please email: permissions@ioppublishing.org.