Stress and microstructure evolution during growth of magnetron-sputtered low-mobility metal films: Influence of the nucleation conditions

Stress and microstructure evolution during growth of magnetron-sputtered low-mobility metal films: Influence of the nucleation conditions
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磁控溅射低迁移率金属薄膜生长过程中的应力和微观结构演变:成核条件的影响

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发表时间:
2010
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通讯作者:
C. Jaouen
C. Jaouen
中科院分区:
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作者:
A. Fillon;G. Abadias;A. Michel;C. Jaouen

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