Plasma Chemistry in an Atmospheric Pressure Ar/NH3 Dielectric Barrier Discharge
Plasma Chemistry in an Atmospheric Pressure Ar/NH3 Dielectric Barrier Discharge
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DOI：
10.1002/ppap.200400051
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发表时间：
2005-03
影响因子：
3.5
通讯作者：
A. Fateev;F. Leipold;Y. Kusano;B. Stenum;E. Tsakadze;H. Bindslev
中科院分区：
文献类型：
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作者：
A. Fateev;F. Leipold;Y. Kusano;B. Stenum;E. Tsakadze;H. Bindslev
摘要：研究了Ar/NH3（0.1 ~ 10%）混合物中具有平行板电极几何结构的常压介质阻挡放电（DBD）。在紫外光谱范围内对等离子体进行了发射光谱和吸收光谱研究。并测量了放电电流和电压。采用紫外吸收光谱法对废气中的稳定产物进行了检测。为了弄清氨分解的不同过程，在血浆中加入N2（2-10%）。建立了Ar/NH3等离子体的化学动力学模型。大气压Ar/NH3 DBD的主要稳定产物是H2、N2和N2H4。测定了不同氨浓度和不同放电功率下，血浆和废气中肼（N2H4）的浓度。N2H4热分解成NH2自由基可用于NOx还原过程。不同氨浓度（0.7、2和10%）的Ar/NH3等离子体中形成的NH自由基发射光谱的差异与NH自由基激发机制的不同有关。
Summary: An atmospheric pressure dielectric barrier discharge (DBD) in Ar/NH3 (0.1–10%) mixtures with a parallel plate electrode geometry was studied. The plasma was investigated by emission and absorption spectroscopy in the UV spectral range. Discharge current and voltage were measured as well. UV absorption spectroscopy was also employed for the detection of stable products in the exhaust gas. To clarify the different processes for ammonia decomposition, N2 (2–10%) was added to the plasma. Modeling of the chemical kinetics in an Ar/NH3 plasma was performed as well. The dominant stable products of an atmospheric pressure Ar/NH3 DBD are H2, N2 and N2H4. The hydrazine (N2H4) concentration in the plasma and in the exhaust gases at various ammonia concentrations and different discharge powers was measured. Thermal N2H4 decomposition into NH2 radicals may be used for NOx reduction processes. The differences in the optical emission spectra of NH radicals formed in Ar/NH3 plasma with various ammonia concentrations (0.7, 2, and 10%) were associated with different excitation mechanisms of NH radicals.